The equipment is send back coated photo-resist material horizontally form Roll to Roll way for Develop double side. And  etching the Developed material to make the pattern. After that Strip coated photo-resist

System Techniques

▪  Roll to Roll System

▪  Double-side process System

▪  Minimize shrinkage, expension & scratch free system

▪  Vouch for Etching Uniformity more than 90% (40Pitch : L20 / S20㎛)